استفاده از گیت کمکی برای بهبود مشخصات الکتریکی ترانزیستور اثر میدان بدون پیوند سیلیکون بر روی عایق
محورهای موضوعی : مهندسی برق و کامپیوتر
1 - دانشگاه آزاد اسلامی واحد ابهر
چکیده مقاله :
در ترانزیستورهای اثر میدان بدون پیوند سیلیکون بر روی عایق (SOI-JLFET)، آلایش سورس- کانال- درین از یک سطح و یک نوع است. بنابراین فرایند ساخت آنها نسبت به ترانزیستورهای اثر میدان مد وارونگی سیلیکون بر روی عایق آسان‌تر است. با این حال، شیب زیرآستانه (SS) زیاد و جریان نشتی بالا در SOI-JLFET، عملکرد آن را برای کاربردهای سرعت بالا و توان پایین با مشکل مواجه کرده است. در این مقاله برای اولین بار استفاده از گیت کمکی در ناحیه درین SOI-JLFET برای بهبود SS و کاهش جریان نشتی پیشنهاد شده است. ساختار پیشنهادشده "SOI-JLFET Aug" نامیده می‌شود. انتخاب بهینه برای تابع کار گیت کمکی و طول آن، سبب بهبود هر دو پارامتر شیب زیرآستانه و نسبت جریان روشنی به جریان خاموشی نسبت به ساختار اصلی، Regular SOI-JLFET شده است. نتایج شبیه‌سازی نشان می‌دهد ساختار SOI-JLFET Aug با طول کانال nm 20، mV/dec 71 ~ SS و نسبت 1013 ~ ION/IOFF دارد. SS و نسبت ION/IOFF ساختار SOI-JLFET Aug نسبت به ساختار Regular SOI-JLFET با ابعاد مشابه، به ترتیب 14% و سه دهه بزرگی بهبود یافته‌اند. افزاره SOI-JLFET Aug می‌تواند کاندید مناسبی برای کاربردهای دیجیتال باشد.
Silicon on insulator junctionless field effect transistor (SOI-JLFET) includes a single type doping at the same level in the source, channel, and drain regions. Therefore, its fabrication process is easier than inversion mode SOI-FET. However, SOI-JLFET suffers from high subthreshold slope (SS) as well as high leakage current. As a result, the SOI-JLFET device has limitation for high speed and low power applications. For the first time in this study, use of the auxiliary gate in the drain region of the SOI-JLFET has been proposed to improve the both SS and leakage current parameters. The proposed structure is called "SOI-JLFET Aug". The optimal selection for the auxiliary gate work function and its length, has improved the both SS and ION/IOFF ratio parameters, as compared to Regular SOI-JLFET. Simulation results show that, SOI-JLFET Aug with 20nm channel length exhibits the SS~71mV/dec and ION/IOFF~1013. SS and ON-state to OFF-state current (ION/IOFF) ratio of SOI-JLFET Aug are improved by 14% and three orders of magnitudes, respectively, as compared to the Regular SOI-JLFET. The SOI-JLEFT Aug could be good candidate for digital applications.
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